| Precision/stability |
| ・ |
High analysis precision and stability can be obtained by the use of a high throughput CPU. (Average error: ±3%) |
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| High speed analysis |
| ・ |
The analysis time can be reduced by the high-speed and high torque metering pumps.
(The analysis of the concentrations of alkali, copper, and formalin, and pH of electroless copper plating bath can be done at a minimum speed of 15 minutes.). |
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| Easy operation |
| ・ |
The operation is very easy and can be done without referring to the instruction manual. |
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| Easy maintenance |
| ・ |
Devices are so positioned that all the maintenance operations may be carried out in the front of the system. |
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| Applicability in overseas |
| ・ |
Using the dedicated transformer, it can be used at different voltages in the major cities of the world |
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| Extendability |
| ・ |
The concentration signal generated by the system can be used as the control signal of other devices. |
| Model |
Process |
Items of analysis |
SA |
Acidic-/ electro-cleaning |
(1) Free acid, including acid concentration |
SH |
Degreasing |
(1) Free alkali, including NaOH |
ZC/A |
Zincate A |
(1)NaOH (2)Zn2+ |
ZC/B |
Zincate B |
(1)NaOH (2)H2CO3 (3)Zn2+ |
EL-Cu/PTH |
Electroless Cu plating |
(1)NaOH (2)HCHO (3)Cu2+ (4)pH |
EL-Ni/P |
Electroless Ni plating for industrial use |
(1)pH (2)Ni2+ |
EL-Ni/A |
Electroless Ni plating for plastics |
(1)pH (2)Ni2+ |
A-66 |
Accelerator |
(1)PC-66H |
MAB |
Reduction (weak acid) |
(1) MAB-4B (acid) (2) MAB-4B (reducing agent) |
N-PC |
Neutralization reduction |
(1)H2SO4 (2)H2O2 (3)Cu2+ |
M-SPS |
Microetching |
(1)H2SO4 (2) SPS (persulfate) (3)Cu2+ |
PB-300 |
Catalyzing |
(1)Pd2+ (2)Cu2+ |
HS |
Solder plating |
(1) Organic acid (2)Sn2+ |
Cu/CN |
Copper cyanide plating |
(1)NaOH (2)CN- (3)Cu2+ |
Ag/CN |
Silver cyanide plating |
(1)NaOH (2)CN- |
DG1 |
Desmearing/degreasing |
(1) Alkalinity (2)Cu2+ |
ET1 |
Desmearing/PI etching |
(1) Alkalinity (2) Permanganic acid (3) Manganic acid |
RD1 |
Desmearing/neutralization reduction
|
(1)pH (2) DS-310 (Reducing agent) |
DG2 |
DPS microetching |
(1) Alkalinity (2) Concentration of copper impurities |
MC1 |
DPS microetching |
(1) Persulfate (2) Sulfuric acid((3) Concentration of copper impurities |
AC1 |
DPS activator |
(1)Pd2+ (2)Sn2+ (3) Concentration of copper impurities |
MT1 |
DPS metallizer |
(1) pH (2) Alkalinity (3) Copper concentration |
SB1 |
DPS stabilizer |
(1) Acid concentration (2) Concentration of copper impurities |