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The SEEDLON process removes the Ni-Cr alloy seed layer that raises a problem in the formation of adhesiveless CCL by sputtering.
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| 1. |
Cyanide-free, low hydrochloride type process. |
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| 2. |
After forming circuits, it removes the Ni-Cr alloy seed layer remaining on the substrate quickly and completely. |
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| 3. |
Scarcely etches the copper circuits. |
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| 4. |
The performance can be maintained stably for a long time. |
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Effect of the SEEDLON process |
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Change in etching rate in continuous use |
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